Study of Annealing Effect on Characteristics of Nickel Boron Alloy Thin Films

Abstract: Alloy thin films of NiB were prepared using electroplating at room temperature. Then electroplated NiB thin films was annealed at 200 o C . NiB deposited films are textured with FCC phase preferred orientation. They were subjected to morphological, structural, and mechanical characterization analysis. NiB films were bright and uniformly coated on the surface. Also, the deposits of NiB films were in nano scale and the average crystalline size was around 61 nm. The micro hardness of NiB was 112 VHN after annealing .

Keywords: Electroplating, electrolytic bath, crystalline size, VSM, Ni-B, X-ray diffraction, VHN, SEM.